关键字导读: TRACK ETCH PVD PECVD MOCVD MEMS CMP COATING CLEAN DETECT
miaoxie: gaoganjingpinji，gaojingdu，gaosuchuanpian，naiqinshi，pengzhuangyanhu，mappinggongxiao，semirenzheng，gongjijiekoujijieweidingzhi。
简介
introduction
daqijixieshoupubianyongyuguijingyuanheledlanbaoshijipianbanyun。shoubeijienajinbuqianbeideguihuazengqiangleshoubeidegangxing，bingyouyongannazhendong，qinglianghuashexiangzhizugaosuqingqiu。bentidezhizuogongyigailiangyouyongxiajiangbenqian，jinshengshichanghezuoli。cailiao、jiagonghewaibiaochuzhiduofangmianyouxuan，yiwanchenggaoganjingdu。jubeiduozhongningjingyanhugongxiao。zhoubuhewanbujiaojiejiezhi，shidejixierennenggoujienasiyizishilaiqufangjingyuan，xukegengduodepianhezhixianpaibu，gengjieliukongjian，shunyingxinggengqiang。shibandaotixingyedeshangfengzhixuan。
参数
parameter
| 规划情势Mechanical Structure | 柱坐标型/SCARA型 Cylindrical Coordinate/SCARA | |
|---|---|---|
| 负载Payload | 称号name | 晶圆wafer |
| 直径diameter | Φ200mm/Φ300mm | |
| 分量weight | ≤0.5kg | |
| 自在度数DOF | 3 | |
| 最大反转展转直径Maximum Swing diameter | 520mm | |
huodongguimo Moving Range | 起落轴 (Z轴)Up/Down( Z)-Axis | 330mm |
| 反转展转轴 (T轴) Rotational(T)-Axis | 330° | |
| 舒展轴 (R轴) Extension(Z)-Axis | R736mm | |
zuidasulv Maximum Moving Speed | 起落轴 (Z轴)Up/Down( Z)-Axis | 330mm/s |
| 反转展转轴 (T轴) Rotational(T)-Axis | 360° | |
| 舒展轴 (R轴) Extension(Z)-Axis | 900mm/s | |
fanfudingweijingdu Repeatability | 起落轴 (Z轴)Up/Down( Z)-Axis | ±0.1 mm(3σ) |
| 反转展转轴 (T轴) Rotational(T)-Axis | ±0.01°(3σ) | |
| 舒展轴 (R轴) Extension(Z)-Axis | ±0.1 mm(3σ) | |
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